For additional information on our process and products please refer to the titles shown below. All papers are in PDF format.

Ion Implant Characterization:

• "Real-Time High Res Dynamic Surface Charge Wafer Mapping for Advanced Ion Implant Process Control" - Poster presented at NIST Conference 03-07
• "Non-contact SPV-based Method for Advanced Ion Implant Process Control" - ASMC07
• "Surface Charge Profiling - An Advancement in Ion Implant Monitoring" - IIT Conference 2006
• "Photoelectric Measurement Method For Implanted Silicon: A Phenomenological Approach" - IIT Conference 2006
• "Comparison Of Production Metrology For High Angle Implantation" - IIT Conference 2004
• "Ion Implant Process Monitoring With A Dynamic Surface Photo-Charge Technique" - ASMC Conference 2004.

SOI Technology:

• "Implant Metrology for Bonded SOI Wafers Using a Surface Photo-voltage Technique" - Poster presented at ECS Meeting, May 2007
• "Non-Contact Method for thin SOI Characterization" - Poster presented at ECS Meeting, May 2007

Epi Characterization:

• "NIST traceable Small Signal Surface Photo Voltage Reference Wafer" - Poster presented at NIST Conference, 03-07
• "Use Of Non-Contact Resistivity Measurements For Epitaxy - SCP Method"
• "EpiLayer Quality & Yield Improvement Using The Surface Charge Profiler As A Non Destructive Diagnostic Technique" - Proceedings of the Electrochemical Society, Vol 99-16.
• "Use Of The Surface Charge Profiler For In-Line Monitoring Of Doping Concentration In Silicon Epitaxial Wafer Manufacturing" - SPIE Proceedings, Vol. 3884 Sept 1999.

Strained Silicon (SiGe and SiC):

• "Photoelectric Method for Non-Contact Characterization of SiGe – Abstract" - ICSI-5 2007

Wafer Cleaning:

• "Cleaning Of Si surfaces By Lamp Illumination" - Presented at UCPSS, September, 2002
• "A Novel Pretreatment For Thin Film Measurements" - Published in Solid State Technology, September 1999

Metal Contamination:

• "Surface Dopant Concentration Measurement Using The Surface Charge Profiler (SCP) Method" - Proceedings of the E-MRS Spring meeting, June 1998
• "Monitoring Of Fe Contamination On Si Surfaces Using Non-Contact Surface Charge Profiler" - Proceedings of the Electrochemical Society Vol 95- 20